From Pixels to Nanometers: Integrating Machine Learning and Mechatronics for Photolithography Automation with a Focus on 2D Materials

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dc.contributor.advisorRAHMAN, ATIKURen_US
dc.contributor.authorRAO, RAVI PRAKASHen_US
dc.contributor.departmentDept. of Physicsen_US
dc.contributor.registration20181127en_US
dc.date.accessioned2024-05-31T11:25:21Z
dc.date.available2024-05-31T11:25:21Z
dc.date.issued2024-05en_US
dc.description.abstractWe have tried to optimize the growth parameters of the CVD growth of Bi2O2Se on various substrates, focusing on f-mica. Also, exploring the various techniques of Photolithography to signify the vital role it plays in 2D material research. Moreover, we have proposed and designed an Automated Maskless Photolithography setup by modifying the existing Photolithography setup with merely Stepper Motors, Raspberry Pi, Arduino, A camera and a DLP.en_US
dc.description.embargoNo Embargoen_US
dc.identifier.citation61en_US
dc.identifier.urihttp://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/8972
dc.language.isoenen_US
dc.subject2D Materialsen_US
dc.subjectPhotolithographyen_US
dc.subjectBismuth Oxyselenideen_US
dc.titleFrom Pixels to Nanometers: Integrating Machine Learning and Mechatronics for Photolithography Automation with a Focus on 2D Materialsen_US
dc.typeThesisen_US
dc.type.degreeBS-MSen_US

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