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PUBLICATIONS & PATENTS
BOOK CHAPTERS
Making Gradient Patterns by Electron‐Beam Chemical Lithography with Monomolecular Resists
Making Gradient Patterns by Electron‐Beam Chemical Lithography with Monomolecular Resists
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Date
2012-06
Authors
BALLAV, NIRMALYA
Terfort, Andreas
Zharnikov, Michael
Journal Title
Journal ISSN
Volume Title
Publisher
Wiley
Abstract
Description
Keywords
EBCL using irradiation
,
Promoted exchange reaction
,
Electron-beam
,
Activation lithography
,
Direct writing
,
Chemical lithography
,
2012
Citation
Soft Matter Gradient Surfaces: Methods and Applications
URI
http://dr.iiserpune.ac.in:8080/xmlui/handle/123456789/4308
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